Ion beam deposition system

lets pilot line in order to increase its coating capabilities as well as increase throughput. The Ion beam system should be able to coat laser bars, laser coupons and PICs that are mounted in jigs and wafers up to a diameter of 200 mm with high quality optical coatings such as Al2O3, TiO2, SiO2 and

Ta2O5. Key system specifications • Dual chamber (loadlock and process chamber) system capable of ion beam deposition, ion beam etching and dual ion beam sputtering • High level of uniformity over an 8” Wafer • Target-carousel with 4 targets