Offen für Angebote
Delivery and installation of a ICP Reactive ion etcher for silicon dielctrics
Frist:23 Nov 2026, 23:55 CET
Ausschreibungsinformationen
TED EUKgs. Lyngby, Dänemark
- Art
- 16
- Verfahren
- Offenes Verfahren
- Referenznummer
- 701524-2026
- CPV
- 42000000 Industrielle Maschinen
DTU Nanolab wishes to acquire a high ion density source reactive ion etcher for oxides and nitrides of silicon to become its new primary instrument for 150 mm wafer processing. Delivery is expected no later than Q3 2027.…
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