Prior Information Notice – Wet Chemical Processing Tool (Single Wafer Etching)

iconductor materials such as InP, GaAs, AlGaAs, and GaN. The tool will enable highly precise and reproducible etching processes on a per-wafer basis, including endpoint detection functionality. Compared to batch processing, the single wafer approach ensures improved process control and reproducibili

ty, which is essential for low-volume, high-precision semiconductor manufacturing. The equipment will be installed in an existing cleanroom environment and must be compatible with ISO class 5 requirements. The procurement procedure is plann