TECHNOLOGY LICENSING OPPORTUNITY: Electroplated Materials and Array Design for Scintillators

nsistent structures that limit performance, scalability, and safety. This capability addresses the limitations of current fabrication methods by eliminating hazardous chemical etching, improving uniformity, and enabling complex geometries at scale. Advantages Enables high-resolution grid fabrication

from high-Z metals (e.g., Re, Au, Re/Ni) Avoids toxic and hazardous chemicals associated with traditional etching Supports scalable production of precision-aligned, high-Z scintillator arrays with low material loss Provides micron-level di