Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System
Ausschreibungsinformationen
TED EUOULU, Finland
- Art
- 7
- Verfahren
- open
- Referenznummer
- 441853-2026
- CPV
- 38000000
University of Oulu is preparing a purchase of an inductively coupled plasma reactive ion etching (ICP-RIE) system. The system will be used in scientific research to fabricate microstructures for various applications, suc…