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Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System

Ausschreibungsinformationen

TED EU

OULU, Finland

Art
7
Verfahren
open
Referenznummer
441853-2026
CPV
38000000

University of Oulu is preparing a purchase of an inductively coupled plasma reactive ion etching (ICP-RIE) system. The system will be used in scientific research to fabricate microstructures for various applications, suc

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