11056 - Research evaporator

he primary objective is to enhance the capabilities of the current system. The desired outcome is a cutting-edge one main chamber setup equipped with a single wafer handler and a load-lock. This upgraded system will serve the purpose of depositing various types of materials, equipped with a dual ele

ctron beam gun to have the possibility to do co-evaporation. Additionally, the system should be equipped with an ion beam source for reactive ion beam assisted deposition and sample cleaning.