High-vacuum chamber for thin-film synthesis

he magnetron sources will be capable of operating in direct-current magnetron sputtering (DCMS), radio-frequency magnetron sputtering (RFMS), and high-power impulse magnetron sputtering (HiPIMS) modes. Key feature of the deposition chamber will be the ability to accommodate and deposited homogeneous

ly on substrates with diameter up to 8 inches (203.2 mm). A quick access port for loading and unloading substrates with a diameter up to 8 inches (203.2 nm) to the deposition chamber will be available. Moreover, the chamber design will allo