Conformal sputtering tool for versatile deposition of thin films with high aspect ratio, dielectrics and piezoelectrics, advanced metal alloys, and multilayer stacks

ules, the system is equipped with additional magnetron sputtering and co-sputtering sources for in situ multilayer thin-film deposition of metals, alloys, dielectrics as well as piezoelectrics. DIRECT AWARD, Article 40 2(2) of Finnish Procurement act (1397/2016) The procurement will be carried out a

s a direct award in accordance with 40 article Section 2(2) of the Finnish Public Procurement Act. Only a certain supplier can implement the procurement for a technical reason, and there are no reasonable alternatives or substitute solution