LA2954C - UL - RFT for the Supply of an Atomic Layer Deposition (ALD) Instrument

Two (2) high vapor pressure (HVP) precursor delivery lines are included in the base system. HVP lines that can be heated to and are rated to 200°C. • One (1) 10 – 150 mL reactor vessel. • Integrated mass spectrometer. • Vacuum pump. • Reactor that is rated up to 400°C. • Multiple fluidization aids t

o enable uniform coatings. • Recipe based software with automated feedback control. • Emergency stop capability. • A removable reactor vessel. • Electrical connections matched to international standards.