- Type
- 29
- Procedure
- open
- Ref. number
- 391306-2025
- Estimated value
- 1,265,000 EUR
- CPV
- 38000000
University of Jyväskylä (JYU) is inviting tenders for a combination of an electron beam lithography system (EBL) and a laser beam lithography system (LBL), both capable of mix-and-match processing based on CAD drawings i…
n GDSII file format. We are searching a Dedicated EBL tool AND a Dedicated LBL tool for research and development of state of the art micro- and nano-scale features requiring high fidelity in patterning and edge smoothness. Contracting authority has a need for high precision and versatile lithography
tools for patterning of optical wave guides and lattices, phononic crystals and mechanic resonators; with the goal of investigating quantum phenomena and the interplay between such structures. Contracting authority has a need for the litho