Metal Organic Chemical Vapor Deposition (MOCVD)

g Line) infrastructure. The system will be used for the controlled deposition of (Al)GaN and multiple 2D materials at atomic scale, supporting research into energy-efficient semiconductors, quantum technologies, and advanced communication systems. The system must be integrated into a contamination-c

ontrolled cleanroom environment and meet a comprehensive set of technical and functional requirements which can be found in uploaded document.