Plasma enhanced atomic layer disposition

e The Product should be capable of depositing the following materials: Al2O3, TiO2, ZnO, In2O3, SnO2, NiOx, SiO2 and HfO2, with the option to easily switch to different materials, such as nitrides like AlN and TiN and metallic layers like Pt and Ru. 1 plasma enhanced atomic disposition system

The Product should coat layers with high uniformity and structures with high aspect ratios. It should be possible to tune the optical properties, density and stress in the films by adjusting deposition parameters. The Th