Sputter coater for scanning electron microscopy

s that satisfy the Government�s anticipated needs. BACKGROUND To support the CHIPS for America Act, the NIST Precision Imaging Facility (PIF) requires an ion milling system to provide final thinning to transmission electron microscope specimens. The coating system is intended to support the scanning

electron microscope, focused ion beam, and transmission electron microscope instruments (among others) in the PIF. NIST is seeking information from sources that may be capable of providing a solution that will achieve the objectives descri