Dry etching of Combined Gallium Nitride Epitaxial Layer and Silicon Carbide Substrate
Deadline:10 Jul 2026, 09:00 GMT-4
Tender information
SAM.govSTENNIS SPACE CENTER, United States
- Type
- Solicitation
- Procedure
- Solicitation
- Ref. number
- 68ae1bb1385c408ea714a38ec1a30b49
- NAICS
- 334413