School of Physics & Astronomy: UV Nanoimprint Lithography System

semiconductors. The system must have capability to align both nanoimprint stamps and photolithography masks to existing features on a sample. The unit must come with toolings for holding both soft stamps for nanoimprint lithography and photomasks for conventional UV photolithography, and sample chuc

ks suitable for a range of sample sizes from 10 mm x 10 mm chips to full wafers.