Supply, Delivery, Installation, Commissioning, and Validation of an Integrated Glove Box-Linked Dual Atomic Layer Deposition (ALD) Reactor System with Collocated Ellipsometer System for Tyndall, UCC

llipsometer System, compromising four main components: (i) ALD Reactor 1: Designed for the deposition of 2D dichalcogenide materials, featuring process conditions and precursor delivery systems optimised for chalcogen-based chemistries. (ii) ALD reactor 2: Configured for the deposition of metal oxid

e films, designed for oxygen-rich precursor processes. (iii) Glove Box Module: Provides a controlled inert atmosphere that connects both ALD reactors, enabling contamination-free sample transfer and handling. (iv) Ellipsometer: Designed to