Inductively Coupled Plasma Reactive Ion Etching (ICP-RIE) System
Tender information
TED EUOULU, Finland
- Type
- 7
- Procedure
- open
- Ref. number
- 441853-2026
- CPV
- 38000000
University of Oulu is preparing a purchase of an inductively coupled plasma reactive ion etching (ICP-RIE) system. The system will be used in scientific research to fabricate microstructures for various applications, suc…