ICP/RIE

all-scale manufacturing of semiconductor components: 1. One inductively coupled plasma system for etching III-V materials; and 2. One plasma system for RIE etching of dielectrics like SiO and SiN. The two systems are procured through two separate lots.

RISE is procuring one or two agreements (each the “Agreement”) for the delivery and commissioning of two separate pieces of equipment that will be placed in a cleanroom and used for research and development as well as sm